ALL CATEGORIES

Gas Analysis System - High Sensitivity In-Situ Gas Analysis

Screw Action Grip

Screw Drive Test System

High Power Feedthrough

Cartesian Planar System

Intellidrives PXY-15X18

Bolometer

Modular Vertical Flow Work Station

Current Source

Research Cryostat/Dewar

RF Generator/Matching Network

High Voltage Power Supply

X-Y-Z and Rotary Microscope Stage

Stage supports many popular microscopes.
Excellent Condition

Kensington MS-4

Molecular Sieve Foreline Trap

Offers an extremely effective method for preventing
backstreaming of mechanical roughing pump oils

Pneumatic Right Angle Vacuum Valve

Pneumatic Butterfly Vacuum Valve

Vibration Isolation Control Platform

Exhaust Valve Core

eS32 is a top-of-the-line mask and wafer inspection equipment that is designed to meet the most stringent quality standards for semiconductor product manufacturing. This system provides comprehensive, high-resolution inspection of both masks and wafers with unparalleled accuracy. The unit uses a proprietary optical probe to scan masks and wafers to detect defects and irregularities with a resolution reaching down to 1 micron. This high-precision scanning allows for comprehensive inspection of the entire surface of both the mask and wafer. The machine also includes powerful image processing and analysis algorithms which automatically detect defects, categorize them, and track their locations. KLA eS32 also includes a suite of automated defect correction tools which can rapidly repair standard and complex defects. In addition to its exhaustive defect detection capabilities, this tool also allows for statistical process control (SPC) analysis to ensure production processes maintain consistent quality and accuracy over time. TENCOR ES 32 also includes a user-friendly interface that makes it easy to operate and manage the asset. This user interface is highly customizable, allowing users to quickly change model settings, view detailed inspection reports, and receive real-time notifications of detected defects. In summary, KLA ES 32 is a high-performance mask and wafer inspection equipment that offers superior detection accuracy, automated defect correction, comprehensive statistical process control (SPC) analysis, and an easy-to-use user interface. This system can be used to monitor production lines, resulting in improved manufacturing quality, increased yield, and cost savings.

Motorized Linear Stage

Klinger B91-57055

Klinger acquired by Newport Corporation

Brand-New and absolute unused Kokusai large batch deposition equipment

Useable for 

• Thin film deposition

• CVD/oxide film deposition

• Platform V3J3N

• Wafer size 200mm
• Original planned (not used) process name: HQ-SiO
• Product Wafer Load Size:100
• Process Temperature Range: 600-750 C
• Main Body ~ Utility Box (L): 2000 mm

•  See also Kokusai Webpage

Flapper View Port Shutter

Shutters protect view ports in sputtering systems.

Multi-Pin Instrumentation Feedthrough

Liquid or Gas Feedthrough

Bellows

New Never Used

Bellows

New Never Used

Right Angle Vacuum Valve

Manual Bellows Sealed Inline Vacuum Valves

Thermocouple Feedthrough

Magnestir, Six Vessel Capacity

Laminar Flow Recirculator/Non-Ducted Work Station


LabGuard Corp. model LFR-1000

LabGuard now Salare Inc.

4" Integrating Sphere on tilting stand.

Model number unknown.  Possibly a custom AdaptaSphere Series sphere.  See detailed photos.

Lamp Power Supply

Sphere System Control

Uniform Source Integrating Sphere

Direct Current Power Supply

High Voltage Power Supply

Two Compartment Dry Box

Laminar Flow Work Station

Vari/Cut Off Saw

Focusing Drive For MS5/MZ6/MZ8