Washers
Washers are specialized cleaning systems used in semiconductor processing to ensure contamination-free wafer surfaces. These machines offer precision cleaning capabilities with features like megasonic frequencies for thorough decontamination and rinse dry cycles for optimal moisture removal.
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MICROAUTOMATION 2066 Mask/Substrate Cleaner - For Parts Only
Mask/Substrate Cleaner - For Parts Only
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WETV18-04 SP304
consisting of the main unit, 3 chemical cabinets and sub-equipment -
WETV76-01 (SST4D)
Ehemalige Chemie-Tankbelegung:
Tank 1: EKC
Tank 2: P1331
Tank 3 und Tank 4: DMF
Tank 5: IPA
Datenblätter siehe Anhang.
Anlagenfehler:
Die Filterkerze vom Tank 4 ist undicht.
Die Tankheizung 1 vom Tank 4 ist defekt und abgeklemmt.
Die Tankheizung 3 vom Tank 4 ist defekt und abgeklemmt.
Common Applications
Semiconductor Manufacturing
Wafer Cleaning
Contamination Control
Precision Cleaning
Frequently Asked Questions
What is the purpose of a megasonic cleaner?
A megasonic cleaner uses high-frequency sound waves to meticulously clean semiconductor wafers, effectively removing microscopic contaminants.
How does a rinse dry system work?
A rinse dry system combines a rinsing process with a drying cycle to eliminate residual water and particles, ensuring pristine wafer surfaces.
What wafer sizes can these washers handle?
These washers can accommodate various wafer sizes, such as 200mm and 300mm, to meet different manufacturing needs.
Why is contamination control important in wafer processing?
Contamination control is crucial to maintain the integrity of semiconductor wafers, preventing defects and ensuring optimal device performance.
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