ASML-AT1250 DUV193nm
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
Other lithography equipment encompasses a range of advanced tools critical for semiconductor manufacturing, providing precision alignment and patterning. These instruments offer high accuracy and repeatability, necessary for maintaining tight process control and achieving sub-micron resolutions in wafer fabrication.
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
ACT DB System, AC Power Box, T/C Unit 1+2, T/H Controller ESA 1+2, Chemical Cabinet 1, 2, 3
AC Power Box, T/C Unit, T/H Controller 1+2, Chemical Cabinet, 4 Coater and 4 Developer
Last Time in production: 5/5/25
two process blocks ACT 12 PIQ with 16 HCH Plates, 4 PCT´s 2 DEV Units, 1 WEE
last time in production: 07.08.2024
'- 12" Standard Wafer Chuck and 12" wafer handling system - SMIF type reticle loading ports and reticle changer unit- Pellicle Particle checker installed
- Hg-lamp will be rmoved prior shipping- Coolant will be removed prior shipping- all batteries will be removed prior shipping
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